ion sputtering

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• ion sputtering source — dulkinamasis jonų šaltinis statusas T sritis radioelektronika atitikmenys: angl. ion sputtering source vok. Ionensputterquelle, f rus. источник для ионного распыления, m pranc. source de pulvérisation ionique, f …   Radioelektronikos terminų žodynas

• ion sputtering chamber — jonų dulkinimo kamera statusas T sritis radioelektronika atitikmenys: angl. ion sputtering chamber vok. Zerstäubungskammer, f rus. камера для ионного распыления, f pranc. chambre de pulvérisation ionique, f …   Radioelektronikos terminų žodynas

• ion sputtering target — dulkinamasis jonų taikinys statusas T sritis radioelektronika atitikmenys: angl. ion sputtering target vok. Zerstäubungskatode, f; Zerstäubungstarget, n rus. мишень для ионного распыления, f pranc. cible du réacteur de pulvérisation ionique, f …   Radioelektronikos terminų žodynas

• thin-film ion sputtering — joninis plonojo sluoksnio dulkinimas statusas T sritis radioelektronika atitikmenys: angl. thin film ion sputtering vok. Dünnschichtsputtern, n rus. ионное напыление тонкой плёнки, n pranc. évaporation ionique de couche mince, f …   Radioelektronikos terminų žodynas

• radio-frequency ion sputtering — aukštadažnis joninis dulkinimas statusas T sritis radioelektronika atitikmenys: angl. radio frequency ion sputtering vok. HF Sputtern, n; Hochfrequenzsputtern, n rus. высокочастотное ионное распыление, n pranc. pulvérisation ionique à haute… …   Radioelektronikos terminų žodynas

• reactive ion sputtering — reaktyvusis joninis dulkinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion sputtering vok. reaktives Sputtern, n rus. реактивное ионное распыление, n pranc. pulvérisation ionique réactive, f …   Radioelektronikos terminų žodynas

• Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… …   Wikipedia

• Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… …   Wikipedia

• Ion plating — is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition . Ion plating utilizes concurrent or periodic bombardment of the substrate and …   Wikipedia

• Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… …   Wikipedia

• Sputtering — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique …   Wikipédia en Français